STANDARD PARTICLE APPLICATION APPARATUS AND STANDARD PARTICLE APPLICATION METHOD

PROBLEM TO BE SOLVED: To provide a standard particle application apparatus capable of stably applying standard particles with suppressed variation of the deposition amount. SOLUTION: The standard particle application apparatus 10 comprises an aerosol generation part 3 for producing aerosol of standa...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	HIRAI MEGUMI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS NOZZLES PERFORMING OPERATIONS PHYSICS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SEMICONDUCTOR DEVICES SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL TESTING TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a standard particle application apparatus capable of stably applying standard particles with suppressed variation of the deposition amount. SOLUTION: The standard particle application apparatus 10 comprises an aerosol generation part 3 for producing aerosol of standard particles 42 from a diluted solution 31 and a deposition tank 21 into which the aerosol of the standard particles 42 is introduced to deposit the standard particles 42 on an object 1 installed inside. A quartz oscillator 51 is arranged near the object 1, wherein, the opening or closing of a standard particle control valve 62 for adjusting the introduction amount of the standard particles 42 into the deposition tank 21 or a diluting water valve 64 for adjusting the supply amount of diluting water to the container 32 containing the diluted solution 31 is controlled from the deposition amount of the standard particles 42 on the quartz oscillator 51. COPYRIGHT: (C)2007,JPO&INPIT