METHOD FOR FORMING INORGANIC LAYER, RESIN COMPOSITE, FILM-LIKE ELEMENT, LAMINATE, PLASMA DISPLAY PANEL, AND FRONT SUBSTRATE THEREFOR

PROBLEM TO BE SOLVED: To provide a method for forming inorganic layer which can form an inorganic layer having a predetermined recessed and protruding pattern with a high enough degree of precision by calcining even once. SOLUTION: The method for forming inorganic layer comprises a first layer formi...

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Bibliographische Detailangaben
Hauptverfasser: YAMAZAKI HIROSHI, OHARA MASAHARU, YAMADA NAOKI, TANAKA HIROYUKI, FURUBAYASHI HIROMI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method for forming inorganic layer which can form an inorganic layer having a predetermined recessed and protruding pattern with a high enough degree of precision by calcining even once. SOLUTION: The method for forming inorganic layer comprises a first layer forming step for forming a first layer 21 on a substrate 40, where the first layer 21 is made of a polymer having a reactive double bond and a first resin composite containing a thermal curing agent and inorganic substance particles; a second layer forming step for forming a second layer 61 on the opposite surface of the first layer 21 to the substrate 40, where the second layer 61 is made of a second resin composite containing the inorganic substance particles and having photosensitivity; an exposure step for exposing the second layer 61 with a predetermined pattern; a resist layer forming step for forming a resist layer 62 having the pattern with the second layer 61 developed after the exposure step; and a calcining step for calcining the resist layer 62 together with the first layer 21 and forming an inorganic layer 70. COPYRIGHT: (C)2007,JPO&INPIT