HOUSING OF EVAPORATION SOURCE FOR VACUUM VAPOR DEPOSITION

PROBLEM TO BE SOLVED: To provide a housing of an evaporation source for vacuum vapor deposition, which prevents an evaporated gas from deforming its molecular structure due to an electron beam, gives a constant directionality of evaporation to the evaporated gas, forms a uniform vapor deposition environment over an article to be vapor-deposited, rapidly evaporates a target in an early stage, and improves the adhesiveness of a deposited film. SOLUTION: The housing of the evaporation source for vacuum vapor deposition has: a chamber for accommodating the evaporation source, formed in the housing; at least one exhaust port so that the chamber can communicate with the outside, formed on the upper part of the housing; and a horizontal plane and a plane perpendicular to the horizontal plane, formed on the upper part of the housing. Thus structured housing does not need special training for the vapor deposition method; forms a uniform and thick deposited film to improve the durability of the film; does not make the evaporated gas exposed to or interfered by the electron beam; accordingly, does not deteriorate inherent characteristics of the evaporated gas; and imparts the film with high adhesiveness. COPYRIGHT: (C)2007,JPO&INPIT