VAPOR PHASE DEPOSITION APPARATUS AND VAPOR PHASE DEPOSITION METHOD USING SAME

PROBLEM TO BE SOLVED: To provide a vapor phase deposition apparatus for easily controlling the vapor phase reaction having large influence on the quality of the deposition and also provide a vapor phase deposition method using the same. SOLUTION: The vapor phase deposition apparatus 21 includes a reactor 22, a reaction pipe 23, a susceptor 27 for placing a substrate 26 to be processed, and a heater 33 for heating the substrate 26 through the susceptor 27. The heater 33 is provided to be movable in the direction parallel to the direction in which the raw material gas flows, and this heater 33 is moved as required in the up-stream or down-stream direction. Therefore, the vapor phase reaction can be controlled. COPYRIGHT: (C)2007,JPO&INPIT