TANTALUM AND NIOBIUM COMPOUND AND THEIR USE FOR CHEMICAL VAPOR DEPOSITION (CVD) PROCESS
PROBLEM TO BE SOLVED: To provide a new precursor compound for forming tantalum and niobium-containing coating, being free from defect which a compound produced by conventional technique has or at least bringing about clear improvement. SOLUTION: The compound is represented by formula (I) [wherein M...
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| creator | VOLZ KERSTIN OCHS THOMAS SUNDERMEYER JOERG POKOJ MICHAEL REUTER KNUD MERKOULOV ALEXEI STOLZ WOLFGANG |
| description | PROBLEM TO BE SOLVED: To provide a new precursor compound for forming tantalum and niobium-containing coating, being free from defect which a compound produced by conventional technique has or at least bringing about clear improvement. SOLUTION: The compound is represented by formula (I) [wherein M is Ta or Nb; R1and R2are each a (cyclo)alkyl group, an aryl group, a 1-, 2- or 3-alkenyl, a triorganosilyl group or an amino group; R3is a (cyclo)alkyl group, an aryl group or SiR3or NR2; R4is a halogen, NH-R5, O-R6, -SiR3, BH4, an allyl group or an indenyl group, a benzyl group, a cyclopentadienyl group or -NR-NR'R" (hydrazide(-1)) or CH2SiMe3, a pseudo-halide or a silylamide; R7and R8are each hydrogen, a (cyclo)alkyl group or an aryl group]. COPYRIGHT: (C)2007,JPO&INPIT |
| format | Patent |
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SOLUTION: The compound is represented by formula (I) [wherein M is Ta or Nb; R1and R2are each a (cyclo)alkyl group, an aryl group, a 1-, 2- or 3-alkenyl, a triorganosilyl group or an amino group; R3is a (cyclo)alkyl group, an aryl group or SiR3or NR2; R4is a halogen, NH-R5, O-R6, -SiR3, BH4, an allyl group or an indenyl group, a benzyl group, a cyclopentadienyl group or -NR-NR'R" (hydrazide(-1)) or CH2SiMe3, a pseudo-halide or a silylamide; R7and R8are each hydrogen, a (cyclo)alkyl group or an aryl group]. 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SOLUTION: The compound is represented by formula (I) [wherein M is Ta or Nb; R1and R2are each a (cyclo)alkyl group, an aryl group, a 1-, 2- or 3-alkenyl, a triorganosilyl group or an amino group; R3is a (cyclo)alkyl group, an aryl group or SiR3or NR2; R4is a halogen, NH-R5, O-R6, -SiR3, BH4, an allyl group or an indenyl group, a benzyl group, a cyclopentadienyl group or -NR-NR'R" (hydrazide(-1)) or CH2SiMe3, a pseudo-halide or a silylamide; R7and R8are each hydrogen, a (cyclo)alkyl group or an aryl group]. COPYRIGHT: (C)2007,JPO&INPIT</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY ORGANIC CHEMISTRY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | TANTALUM AND NIOBIUM COMPOUND AND THEIR USE FOR CHEMICAL VAPOR DEPOSITION (CVD) PROCESS |
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