TANTALUM AND NIOBIUM COMPOUND AND THEIR USE FOR CHEMICAL VAPOR DEPOSITION (CVD) PROCESS
PROBLEM TO BE SOLVED: To provide a new precursor compound for forming tantalum and niobium-containing coating, being free from defect which a compound produced by conventional technique has or at least bringing about clear improvement. SOLUTION: The compound is represented by formula (I) [wherein M...
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Zusammenfassung: | PROBLEM TO BE SOLVED: To provide a new precursor compound for forming tantalum and niobium-containing coating, being free from defect which a compound produced by conventional technique has or at least bringing about clear improvement. SOLUTION: The compound is represented by formula (I) [wherein M is Ta or Nb; R1and R2are each a (cyclo)alkyl group, an aryl group, a 1-, 2- or 3-alkenyl, a triorganosilyl group or an amino group; R3is a (cyclo)alkyl group, an aryl group or SiR3or NR2; R4is a halogen, NH-R5, O-R6, -SiR3, BH4, an allyl group or an indenyl group, a benzyl group, a cyclopentadienyl group or -NR-NR'R" (hydrazide(-1)) or CH2SiMe3, a pseudo-halide or a silylamide; R7and R8are each hydrogen, a (cyclo)alkyl group or an aryl group]. COPYRIGHT: (C)2007,JPO&INPIT |
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