REMOTE PLASMA GENERATION UNIT, ELECTRIC-FIELD DISTRIBUTION MEASUREMENT DEVICE THEREFOR, PROCESSOR, CHARACTERISTIC ADJUSTMENT METHOD FOR REMOTE PLASMA GENERATION UNIT

PROBLEM TO BE SOLVED: To provide a remote plasma generation unit capable of improving an electric field distribution of a microwave in a remote plasma generation tube. SOLUTION: The remote plasma generation unit 70 is composed of the remote plasma generation tube 26 for allowing an activating gas to...

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Hauptverfasser:	OSADA ISATERU, KASAI SHIGERU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a remote plasma generation unit capable of improving an electric field distribution of a microwave in a remote plasma generation tube. SOLUTION: The remote plasma generation unit 70 is composed of the remote plasma generation tube 26 for allowing an activating gas to flow inside; and a metallic cooling tube 28 which is spirally wound around the remote plasma generation tube, and for allowing a cooling medium to flow inside and whose both end sides are grounded. The activating gas flowing in the remote plasma generation tube is activated by plasmatizing it with the microwave supplied from the outside. A grounding position adjustment means 72 for adjusting a grounding position in the lengthwise direction of the cooling tube is provided to the end of the remote plasma generation tube. The grounding position of the cooling tube is adjusted with the grounding position adjustment means. COPYRIGHT: (C)2007,JPO&INPIT