METHOD OF MANUFACTURING LIGHT MODULATED GLASS

PROBLEM TO BE SOLVED: To provide a method of manufacturing a light modulated glass by which a vanadium oxide film is stably formed at a high film-forming rate over a long period by a CVD process. SOLUTION: When a thin film 1 consisting mainly of vanadium oxide is formed on a substrate by supplying a...

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Bibliographische Detailangaben
Hauptverfasser:	FUJISAWA AKIRA, SUEYOSHI YUKIO
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL DYES GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL JOINING GLASS TO GLASS OR OTHER MATERIALS MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MINERAL OR SLAG WOOL MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method of manufacturing a light modulated glass by which a vanadium oxide film is stably formed at a high film-forming rate over a long period by a CVD process. SOLUTION: When a thin film 1 consisting mainly of vanadium oxide is formed on a substrate by supplying a vanadium compound containing chlorine and a gaseous starting material containing steam onto the substrate and allowing the vanadium compound (for example, vanadium chloride, vanadium oxychloride) to react with steam, hydrogen chloride is added into the gaseous starting material. Hydrogen chloride inhibits the reaction of the vanadium compound with steam. The substrate is preferably composed of, for example, a glass plate 7 and a thin film 2 formed on the glass plate 7 and consisting mainly of tin oxide. COPYRIGHT: (C)2007,JPO&INPIT