RADIATION SOURCE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To improve efficiency of conversion of electrical energy to radiation. SOLUTION: To improve conversion efficiency of a radiation source including an anode and a cathode, the anode and the cathode being configured and arranged to create a discharge in a substance in a space betw...

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Hauptverfasser: BANINE VADIM YEVGENYEVICH, ZUKAVISHVILI GIVI GEORGIEVITCH, IVANOV VLADIMIR VITAL'EVITCH, KOROB EVGENII DMITREEVITCH, PAVEL STANISLAVOVICH ANTSIFEROV, KOSHELEV KONSTANTIN NIKOLAEVITCH
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To improve efficiency of conversion of electrical energy to radiation. SOLUTION: To improve conversion efficiency of a radiation source including an anode and a cathode, the anode and the cathode being configured and arranged to create a discharge in a substance in a space between the anode and cathode and to form plasma so as to generate electromagnetic radiation, the radiation source unit is constructed to have a low inductance and to operate with a minimum of plasma. To improve heat dissipation, a fluid circulation system is created within the radiation source space and a wick by using a fluid in both its vapor and liquid phases. To prevent contamination from entering a lithographic projection apparatus, the radiation source unit is constructed to minimize the production of contamination, and a trap is employed to capture the contamination without interfering with the emitted radiation. COPYRIGHT: (C)2007,JPO&INPIT