FILLING METHOD OF LOW-TEMPERATURE LIQUEFIED GAS

PROBLEM TO BE SOLVED: To provide a filling method of low-temperature liquefied gas for filling low-temperature liquefied gas such as nitrogen trifluoride, nitrogen, oxygen, argon, sulfur hexafluoride, anhydrous hydrogen chloride, anhydrous hydrogen bromide, carbon tetrafluoride, and ethane haxafluor...

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Bibliographische Detailangaben
Hauptverfasser: KIM DAE HYUN, JANG HYANG JA, KIM CHEOL HO, IIKUBO YUICHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a filling method of low-temperature liquefied gas for filling low-temperature liquefied gas such as nitrogen trifluoride, nitrogen, oxygen, argon, sulfur hexafluoride, anhydrous hydrogen chloride, anhydrous hydrogen bromide, carbon tetrafluoride, and ethane haxafluoride requiring high purity into a high pressure gas container by a simple process using little amount of energy without altering the purity. SOLUTION: The filling method for low-temperature liquefied gas is provided, which is a method for filling low-temperature liquefied gas into a high pressure filling container, characterized in that low-temperature liquefied gas transporting piping is thermal insulating piping and gas is filled into the high pressure filling container using a pump. COPYRIGHT: (C)2007,JPO&INPIT