SEMICONDUCTOR-SUBSTRATE TREATING SYSTEM

PROBLEM TO BE SOLVED: To prevent the abnormality of a shape in the case of the formation of the pattern of a chemically amplifying resist, by supplying a pure gas, as required. SOLUTION: A semiconductor-substrate treating system has a supply tank 1 for storing the gas confirming a purity, and substrate treatment equipment 2 with a gas-cleaning facility. The system further has a gas control unit 3 for changing over and controlling whether the substrate treatment equipment 2 is supplied with the gas in the supply tank 1 and a circulator 4 circulating the gas in the substrate treatment equipment 2. When abnormality in the shape of the chemically amplifying resist is generated, when the pattern of the resist is formed in the substrate treatment equipment 2, the pattern of the resist can be formed normally, even when the cause generating the abnormality of the shape cannot be specified, because the substrate treatment equipment 2 is supplied with the clean gas from the supply tank 1. COPYRIGHT: (C)2007,JPO&INPIT