BEST FOCUS POSITION MEASURING METHOD AND ASTIGMATIC DIFFERENCE MEASURING METHOD

PROBLEM TO BE SOLVED: To respond to the point that it is necessary to perform measuring of the best focus position of a projection optical system with a high precision as the line width of a semiconductor device is reduced; and to perform measuring of the astigmatic difference in the same way. SOLUT...

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1. Verfasser: AKIYAMA KEIJIRO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To respond to the point that it is necessary to perform measuring of the best focus position of a projection optical system with a high precision as the line width of a semiconductor device is reduced; and to perform measuring of the astigmatic difference in the same way. SOLUTION: A spatial image of line and space patterns is formed through the projection optical system. The optical intensity distribution of this image is scanned by an aperture slit or the like and is converted into electrical signal patterns. The electrical signal patterns are measured in a plurality of positions on the optical axis. The obtained electrical signal patterns are developed in the form of Fourier series for finding a tertiary coefficient. The tertiary coefficient is determined as a function of the position on the optical axis by approximating the curve and the position of the maximum value is found. COPYRIGHT: (C)2007,JPO&INPIT