MANUFACTURING METHOD OF THIN FILM FORMATION SUBSTRATE, AND MAGNETIC DISK USING IT

PROBLEM TO BE SOLVED: To provide a manufacturing method of thin film formation substrate by which a substrate having a surface on which a fine pattern is formed with high precision can be obtained, with high degree of freedom in process conditions and material selection. SOLUTION: This method is con...

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Bibliographische Detailangaben
Hauptverfasser: UCHIYAMA HIROICHI, KITA HIROYUKI, OKAMOTO TADASHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a manufacturing method of thin film formation substrate by which a substrate having a surface on which a fine pattern is formed with high precision can be obtained, with high degree of freedom in process conditions and material selection. SOLUTION: This method is constituted of; a film formation process which deposits a thin film 2 of single-layer or multilayer on a substrate 1 for a metal mold having an uneven pattern on the surface; a heating and pressing process which carries out heating and pressing of the substrate 1 for the metal mold and a transferred substrate 3 which consists of a material to be softened by heating through the above thin film 2; and a substrate removing process for removing the substrate 1 for the metal mold in order to make a status that at least a part of transferred substrate 3 is coated by the above thin film 2. COPYRIGHT: (C)2007,JPO&INPIT