CATALYST CHEMICAL VAPOR DEPOSITION EQUIPMENT

PROBLEM TO BE SOLVED: To provide a catalyst chemical vapor deposition equipment of such a simple configuration as a shower head is separated from a catalyst supporting part, in which the distance among the shower head, catalyst wire, and substrate can be adjusted as a process optimization condition, equipped with a purging function capable of preventing occurrence of foreign substance at a low temperature part. SOLUTION: The equipment comprises a process chamber 1, a shower head 7 so configured as to guide a process gas into the process chamber 1, a catalyst wire 8 so configured in the process chamber 1 as to decompose the gas introduced from the shower head 7, a catalyst supporting part 800 so configured as to support the catalyst wire 8, a substrate S on which the gas decomposed by the catalyst wire 8 is vapor-deposited, and a substrate supporting part 4 for supporting the substrate S. COPYRIGHT: (C)2007,JPO&INPIT