LITHOGRAPHY EQUIPMENT, SYSTEM AND METHOD FOR DETECTING POSITION AMOUNT

PROBLEM TO BE SOLVED: To provide lithography equipment comprising a position amount deciding system for deciding a position amount of a movable part which is at least partially surrounded by an area containing a fluid in operation. SOLUTION: The position amount deciding system comprises an interfero...

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Hauptverfasser: DE ROOIJ GERARDUS MARTINUS ANTONIUS, LEVASIER LEON M, LALLEMANT NICOLAS A, VAN DONKELAAR EDWIN T, DRAAIJER EVERT HENDRIK JAN
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide lithography equipment comprising a position amount deciding system for deciding a position amount of a movable part which is at least partially surrounded by an area containing a fluid in operation. SOLUTION: The position amount deciding system comprises an interferometer system, a global sensor for deciding the local value of the physical value of the fluid in the area, and a local sensor for deciding the local value of the physical value of the fluid in a part of the area. The position amount deciding system is constituted so as to decide the position amount from the output of an interferometer, the global value of the physical value, and the local value of the physical value. The physical value sometimes contains pressure, temperature, etc. A local physical value deciding system can contain a sensor such as a high speed sensor and a computation hydrokinetics model or a linear approximation model. COPYRIGHT: (C)2007,JPO&INPIT