ELECTRON BEAM ADJUSTMENT METHOD AND OPTICAL DISK MASTER DRAWING DEVICE USING THIS METHOD

PROBLEM TO BE SOLVED: To provide an electron beam adjustment method to create a highly precise focus mark which has a high coaxial level with a center of rotation of a rotary table and uniform groove depth on a substrate which forms a focus mark, and an optical disk master drawing device using this method. SOLUTION: While rotating a work 200 (substrate) placed on a rotary table 61, and involved in a technology to carry out drawing to create the optical disk master with radiation of an electron beam, a focus mark of a shape similar to rotation trajectory of the rotary table 61 is formed on the substrate. Then, in the electron beam adjustment method of optical disk master drawing device using the focus adjustment method for performing focus adjustment of the electron beam, a conductive contact 401 is made to abut to a formed focus mark groove, an electric resistance value between the substrate and the conductive contact 401 is measured, and the stripped state of a resist agent applied to the substrate is checked, and the shape of the focus mark is detected. COPYRIGHT: (C)2007,JPO&INPIT