ETCHING SOLUTION OF LIQUID CRYSTAL POLYMER AND METHOD FOR ETCHING LIQUID CRYSTAL POLYMER

PROBLEM TO BE SOLVED: To obtain an etching solution suitably useful for forming device holes, via holes, etc., in a liquid crystal polymer substrate by an etching process and to provide an etching method used therefor. SOLUTION: The etching solution of a liquid crystal polymer comprises ≥30 wt.% and...

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Hauptverfasser: KOYAMA MINORU, AKITA MASANORI, TOMIYAMA KOJI, NOGAMI TAKAMASA, KANEKO YOSHIHARU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To obtain an etching solution suitably useful for forming device holes, via holes, etc., in a liquid crystal polymer substrate by an etching process and to provide an etching method used therefor. SOLUTION: The etching solution of a liquid crystal polymer comprises ≥30 wt.% and