WIPING SOLVENT

PROBLEM TO BE SOLVED: To provide a wiping solvent which does not have a risk causing the contact failure of electric parts in semiconductor-producing apparatuses or the like, can obey the organic solvent intoxication prevention rules and the environmental laws, does not leave stains, when a metal mi...

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Hauptverfasser:	KOJIMA TATSUYA, MOTOMIYA SHINSUKE, TAKAHASHI TAKASHI
Format:	Patent
Sprache:	eng
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES CANDLES CHEMICAL SURFACE TREATMENT CHEMISTRY CLEANING CLEANING IN GENERAL CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DETERGENT COMPOSITIONS DETERGENTS DIFFUSION TREATMENT OF METALLIC MATERIAL FATTY ACIDS THEREFROM INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL RECOVERY OF GLYCEROL RESIN SOAPS SOAP OR SOAP-MAKING TRANSPORTING USE OF SINGLE SUBSTANCES AS DETERGENTS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a wiping solvent which does not have a risk causing the contact failure of electric parts in semiconductor-producing apparatuses or the like, can obey the organic solvent intoxication prevention rules and the environmental laws, does not leave stains, when a metal mirror face is wiped with hands, can easily be dried, and is friendly for environments. SOLUTION: This wiping solvent for wiping metal mirror faces comprises a mixture of ethanol with cyclohexane. The mixing weight molar ratio of the ethanol to the cyclohexane is 4.5 : 5.5 to 5.5 : 4.5. COPYRIGHT: (C)2007,JPO&INPIT