MANUFACTURING METHOD OF THIN FILM DEPOSITION SUBSTRATE, AND DISK FOR RECORDING AND PLAYBACK USING THE SAME

PROBLEM TO BE SOLVED: To provide the manufacturing method of a thin film deposition substrate which is excellent in high density recording property and surface flatness, in a method of depositing thin film of a single layer or a multi-layer, and a disk for recording and playback. SOLUTION: The metho...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: UCHIYAMA HIROICHI, KITA HIROYUKI, OKAMOTO TADASHI
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator UCHIYAMA HIROICHI
KITA HIROYUKI
OKAMOTO TADASHI
description PROBLEM TO BE SOLVED: To provide the manufacturing method of a thin film deposition substrate which is excellent in high density recording property and surface flatness, in a method of depositing thin film of a single layer or a multi-layer, and a disk for recording and playback. SOLUTION: The method includes: a film deposition process for depositing the thin-film 2 of a single layer or a multi-layer on a substrate 1 for film deposition whose surface is flat; a pressurizing process for heating and pressurizing the substrate 1 for film deposition and a thermoplastic substrate 3 across the thin film 2 and making the thin film 2 press-contact with the thermoplastic substrate 3; and a coating process for removing the substrate 1 for film deposition and coating at least a part of the principal surface of the thermoplastic substrate 3 with the thin film 2. Flatness of the principal surface of the thermoplastic substrate 3 and the thin film 2 transferred to the principal surface can be made satisfactory, and the film 2 having a property being sufficient for the thermoplastic substrate 3 of which the heat resistance is low. COPYRIGHT: (C)2007,JPO&INPIT
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2006277863A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2006277863A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2006277863A3</originalsourceid><addsrcrecordid>eNqNjLsKwjAUQLs4iPoPF2eF0kLrepuHiW2SktwMTqVIHES0UP8fKfgBTgcOh7POHgZtlMgoem3PYAQpx8FJIKUtSN0Z4KJ3QZN2FkJsAnkkcQC0HLgOLUjnwQvmPF8Gi-47vDbIWohhUaQEBDRim63u43NOux832V4KYuqYpveQ5mm8pVf6DJe-yPOqqOtTVWL5V_QF1Mo2TA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>MANUFACTURING METHOD OF THIN FILM DEPOSITION SUBSTRATE, AND DISK FOR RECORDING AND PLAYBACK USING THE SAME</title><source>esp@cenet</source><creator>UCHIYAMA HIROICHI ; KITA HIROYUKI ; OKAMOTO TADASHI</creator><creatorcontrib>UCHIYAMA HIROICHI ; KITA HIROYUKI ; OKAMOTO TADASHI</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide the manufacturing method of a thin film deposition substrate which is excellent in high density recording property and surface flatness, in a method of depositing thin film of a single layer or a multi-layer, and a disk for recording and playback. SOLUTION: The method includes: a film deposition process for depositing the thin-film 2 of a single layer or a multi-layer on a substrate 1 for film deposition whose surface is flat; a pressurizing process for heating and pressurizing the substrate 1 for film deposition and a thermoplastic substrate 3 across the thin film 2 and making the thin film 2 press-contact with the thermoplastic substrate 3; and a coating process for removing the substrate 1 for film deposition and coating at least a part of the principal surface of the thermoplastic substrate 3 with the thin film 2. Flatness of the principal surface of the thermoplastic substrate 3 and the thin film 2 transferred to the principal surface can be made satisfactory, and the film 2 having a property being sufficient for the thermoplastic substrate 3 of which the heat resistance is low. COPYRIGHT: (C)2007,JPO&amp;INPIT</description><language>eng</language><subject>INFORMATION STORAGE ; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER ; PHYSICS</subject><creationdate>2006</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20061012&amp;DB=EPODOC&amp;CC=JP&amp;NR=2006277863A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20061012&amp;DB=EPODOC&amp;CC=JP&amp;NR=2006277863A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>UCHIYAMA HIROICHI</creatorcontrib><creatorcontrib>KITA HIROYUKI</creatorcontrib><creatorcontrib>OKAMOTO TADASHI</creatorcontrib><title>MANUFACTURING METHOD OF THIN FILM DEPOSITION SUBSTRATE, AND DISK FOR RECORDING AND PLAYBACK USING THE SAME</title><description>PROBLEM TO BE SOLVED: To provide the manufacturing method of a thin film deposition substrate which is excellent in high density recording property and surface flatness, in a method of depositing thin film of a single layer or a multi-layer, and a disk for recording and playback. SOLUTION: The method includes: a film deposition process for depositing the thin-film 2 of a single layer or a multi-layer on a substrate 1 for film deposition whose surface is flat; a pressurizing process for heating and pressurizing the substrate 1 for film deposition and a thermoplastic substrate 3 across the thin film 2 and making the thin film 2 press-contact with the thermoplastic substrate 3; and a coating process for removing the substrate 1 for film deposition and coating at least a part of the principal surface of the thermoplastic substrate 3 with the thin film 2. Flatness of the principal surface of the thermoplastic substrate 3 and the thin film 2 transferred to the principal surface can be made satisfactory, and the film 2 having a property being sufficient for the thermoplastic substrate 3 of which the heat resistance is low. COPYRIGHT: (C)2007,JPO&amp;INPIT</description><subject>INFORMATION STORAGE</subject><subject>INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2006</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjLsKwjAUQLs4iPoPF2eF0kLrepuHiW2SktwMTqVIHES0UP8fKfgBTgcOh7POHgZtlMgoem3PYAQpx8FJIKUtSN0Z4KJ3QZN2FkJsAnkkcQC0HLgOLUjnwQvmPF8Gi-47vDbIWohhUaQEBDRim63u43NOux832V4KYuqYpveQ5mm8pVf6DJe-yPOqqOtTVWL5V_QF1Mo2TA</recordid><startdate>20061012</startdate><enddate>20061012</enddate><creator>UCHIYAMA HIROICHI</creator><creator>KITA HIROYUKI</creator><creator>OKAMOTO TADASHI</creator><scope>EVB</scope></search><sort><creationdate>20061012</creationdate><title>MANUFACTURING METHOD OF THIN FILM DEPOSITION SUBSTRATE, AND DISK FOR RECORDING AND PLAYBACK USING THE SAME</title><author>UCHIYAMA HIROICHI ; KITA HIROYUKI ; OKAMOTO TADASHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2006277863A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2006</creationdate><topic>INFORMATION STORAGE</topic><topic>INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>UCHIYAMA HIROICHI</creatorcontrib><creatorcontrib>KITA HIROYUKI</creatorcontrib><creatorcontrib>OKAMOTO TADASHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>UCHIYAMA HIROICHI</au><au>KITA HIROYUKI</au><au>OKAMOTO TADASHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MANUFACTURING METHOD OF THIN FILM DEPOSITION SUBSTRATE, AND DISK FOR RECORDING AND PLAYBACK USING THE SAME</title><date>2006-10-12</date><risdate>2006</risdate><abstract>PROBLEM TO BE SOLVED: To provide the manufacturing method of a thin film deposition substrate which is excellent in high density recording property and surface flatness, in a method of depositing thin film of a single layer or a multi-layer, and a disk for recording and playback. SOLUTION: The method includes: a film deposition process for depositing the thin-film 2 of a single layer or a multi-layer on a substrate 1 for film deposition whose surface is flat; a pressurizing process for heating and pressurizing the substrate 1 for film deposition and a thermoplastic substrate 3 across the thin film 2 and making the thin film 2 press-contact with the thermoplastic substrate 3; and a coating process for removing the substrate 1 for film deposition and coating at least a part of the principal surface of the thermoplastic substrate 3 with the thin film 2. Flatness of the principal surface of the thermoplastic substrate 3 and the thin film 2 transferred to the principal surface can be made satisfactory, and the film 2 having a property being sufficient for the thermoplastic substrate 3 of which the heat resistance is low. COPYRIGHT: (C)2007,JPO&amp;INPIT</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_JP2006277863A
source esp@cenet
subjects INFORMATION STORAGE
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER
PHYSICS
title MANUFACTURING METHOD OF THIN FILM DEPOSITION SUBSTRATE, AND DISK FOR RECORDING AND PLAYBACK USING THE SAME
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-10T18%3A45%3A52IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=UCHIYAMA%20HIROICHI&rft.date=2006-10-12&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2006277863A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true