MANUFACTURING METHOD OF THIN FILM DEPOSITION SUBSTRATE, AND DISK FOR RECORDING AND PLAYBACK USING THE SAME

PROBLEM TO BE SOLVED: To provide the manufacturing method of a thin film deposition substrate which is excellent in high density recording property and surface flatness, in a method of depositing thin film of a single layer or a multi-layer, and a disk for recording and playback. SOLUTION: The metho...

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Bibliographische Detailangaben
Hauptverfasser: UCHIYAMA HIROICHI, KITA HIROYUKI, OKAMOTO TADASHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide the manufacturing method of a thin film deposition substrate which is excellent in high density recording property and surface flatness, in a method of depositing thin film of a single layer or a multi-layer, and a disk for recording and playback. SOLUTION: The method includes: a film deposition process for depositing the thin-film 2 of a single layer or a multi-layer on a substrate 1 for film deposition whose surface is flat; a pressurizing process for heating and pressurizing the substrate 1 for film deposition and a thermoplastic substrate 3 across the thin film 2 and making the thin film 2 press-contact with the thermoplastic substrate 3; and a coating process for removing the substrate 1 for film deposition and coating at least a part of the principal surface of the thermoplastic substrate 3 with the thin film 2. Flatness of the principal surface of the thermoplastic substrate 3 and the thin film 2 transferred to the principal surface can be made satisfactory, and the film 2 having a property being sufficient for the thermoplastic substrate 3 of which the heat resistance is low. COPYRIGHT: (C)2007,JPO&INPIT