PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL

PROBLEM TO BE SOLVED: To provide a photosensitive composition having satisfactory sensitivity and superior in development stability, and to further provide a photosensitive composition and a photosensitive lithographic printing plate material that is free of surface soiling, after passage of time in...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	NAGAHAMA MASARU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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