PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL

PROBLEM TO BE SOLVED: To provide a photosensitive composition having satisfactory sensitivity and superior in development stability, and to further provide a photosensitive composition and a photosensitive lithographic printing plate material that is free of surface soiling, after passage of time in...

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Bibliographische Detailangaben
1. Verfasser: NAGAHAMA MASARU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a photosensitive composition having satisfactory sensitivity and superior in development stability, and to further provide a photosensitive composition and a photosensitive lithographic printing plate material that is free of surface soiling, after passage of time in storage and superior in processing stability. SOLUTION: The photosensitive composition contains, at least a sensitizing dye, a photopolymerization initiator and a compound represented by Formula (1), wherein R01-R03each independently represent H, an aliphatic group, an aromatic group, a heterocyclic group or another substitutable group, R01and R02may bond to each other to form a heterocycle; R04represents H, an aliphatic group, an aromatic group, a heterocyclic group, amino, hydrazino or OR05, R05represents H, an aliphatic group, an aromatic group or a heterocyclic group; and L01represents a divalent linking group. COPYRIGHT: (C)2007,JPO&INPIT