POLYURETHANE FILM HAVING EXCELLENT BLOCKING RESISTANCE

PROBLEM TO BE SOLVED: To provide a soft polyurethane film having improved operation efficiency and a good touch feeling without causing blocking when a polyurethane resin composition is formed into a film and once wound and the wound film is then developed and transferred to the next processing step...

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Bibliographische Detailangaben
1. Verfasser: IMANAKA MASAYOSHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a soft polyurethane film having improved operation efficiency and a good touch feeling without causing blocking when a polyurethane resin composition is formed into a film and once wound and the wound film is then developed and transferred to the next processing step. SOLUTION: The polyurethane film having excellent blocking resistance is obtained by using a polyurethane resin composition consisting essentially of a polyurethane resin (A) obtained from a polyol (a) having ≥2 groups having reactivity with isocyanate groups and 60-140 molecular weight, a polyol (b) having ≥2 hydroxy groups and 140-4,000 number-average molecular weight and a diisocyanate (c), wet process silica (B) and a fatty acid amide (C). In the polyurethane resin composition, the content of the (B) is 5-30 pts. and the content of the (C) is 0.01-3 pts. based on 100 pts. of the solid content of the (A). The sum (X) of the content of the wet process silica (B) based on 100 pts. of the solid content of the (A) and the value of 10 times the content of the fatty acid amide (C) is within the range of 10-30. COPYRIGHT: (C)2007,JPO&INPIT