LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD USING REPEATED PATTERN IN LCD TO REDUCE DATAPATH VOLUME

PROBLEM TO BE SOLVED: To provide a system and a method for enhancing the performance of a lithographic system free from a mask by reducing pattern data required in datapath to a pattern generator. SOLUTION: A method and device for programming an array of individually controllable elements is configu...

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Bibliographische Detailangaben
Hauptverfasser:	AKKER THEODORUS LEONARDUS VAN DEN, HENDRICUS HOEKS MARTINUS H, DE JAGER PIETER W H, VAN HASSEL MARCO CORNELIS J M, MORSELT FRANK A, KESSELS LAMBERTUS G M
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a system and a method for enhancing the performance of a lithographic system free from a mask by reducing pattern data required in datapath to a pattern generator. SOLUTION: A method and device for programming an array of individually controllable elements is configured to impart a beam with a pattern. For example, the method can be suitable for use in a lithographic apparatus. The method comprises generating first data representing a first pattern, generating second data representing a second pattern, writing the first data to a first buffer, and reading the first data from the first buffer to program the array of individually controllable elements to display the first pattern, while writing the second data to a second buffer in parallel. COPYRIGHT: (C)2007,JPO&INPIT