METHOD FOR MANUFACTURING PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE

PROBLEM TO BE SOLVED: To obtain a photosensitive coating liquid having stable sensitivity even after long-term storage, and to provide a method for manufacturing a photosensitive composition improved in work efficiency and production efficiency. SOLUTION: In the method for manufacturing the photosen...

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Bibliographische Detailangaben
Hauptverfasser:	NAGAHAMA MASARU, MIYAZAKI TAKASHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Zusammenfassung:	PROBLEM TO BE SOLVED: To obtain a photosensitive coating liquid having stable sensitivity even after long-term storage, and to provide a method for manufacturing a photosensitive composition improved in work efficiency and production efficiency. SOLUTION: In the method for manufacturing the photosensitive composition containing at least a polymerizable polymer, a trihaloalkyl substituted compound and a sensitizing dye which sensitizes in a wavelength region of 380-1,300 nm, coating liquids of the photosensitive composition are separately prepared so that the trihaloalkyl substituted compound and the sensitizing dye do not exist together, and the coating liquids are stored, mixed before starting application, and applied. COPYRIGHT: (C)2007,JPO&INPIT