STACK STRUCTURE AND ITS MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a stack structure constituted of a substrate other than a silicon substrate, and its manufacturing method. SOLUTION: In the stack structure 1 obtained by stacking a first glass substrate 2 having a thin film heater 5, wherein an exothermic resistor film 6 is formed t...

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Bibliographische Detailangaben
1. Verfasser:	TERASAKI TSUTOMU
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY GLASS INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES JOINING GLASS TO GLASS OR OTHER MATERIALS MEASURING METALLURGY MINERAL OR SLAG WOOL PHYSICS SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS TESTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a stack structure constituted of a substrate other than a silicon substrate, and its manufacturing method. SOLUTION: In the stack structure 1 obtained by stacking a first glass substrate 2 having a thin film heater 5, wherein an exothermic resistor film 6 is formed through an adhesive film 8, provided on its one side 2a on a second glass substrate 4 to anodically join both substrates, a joining film 3 for anodically joining the second glass substrate 4 is formed on the part other than the adhesive film 8 of one side 2a of the first glass substrate 2, and the adhesive film 8 and the joining film 3 comprise the same component composition. COPYRIGHT: (C)2007,JPO&INPIT