METHOD FOR MANUFACTURING THIN-FILM MAGNETIC HEAD

PROBLEM TO BE SOLVED: To manufacture a thin-film magnetic head higher in accuracy by accurately forming a lift-off pattern used when the read element of the thin-film magnetic head is formed and suppressing a manufacturing variance of the thin-film magnetic head. SOLUTION: This method includes: a st...

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Bibliographische Detailangaben
Hauptverfasser: FUJITA MUTSUMI, FUJIEDA HIROSHI, KOJIMA TAKASHI, KANEDA WATARU, IKEGAWA YUKINORI, OZAKI TOKUICHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To manufacture a thin-film magnetic head higher in accuracy by accurately forming a lift-off pattern used when the read element of the thin-film magnetic head is formed and suppressing a manufacturing variance of the thin-film magnetic head. SOLUTION: This method includes: a step of stacking a reflection preventive film 20 made of a film material not dipped in a developer for developing a resist film 30 stacked on a magnetoresistive effect film 12, and the resist film 30 made of a resist material bear with the treatment of ashing the reflection preventing film on the magnetoresistive effect film 12; a step of forming a resist pattern 30a by exposing and developing the resist film 30; a step of ashing the reflection preventive film 20 and constituting a peaked lift-off pattern 22 of the ashed reflection preventive film 20a and the resist pattern 30a; and a step of using the lift-off pattern 22 to execute ion milling and forming an insulating film. COPYRIGHT: (C)2006,JPO&NCIPI