PUMP, AND LIQUID SUPPLY DEVICE PROVIDED WITH THE SAME

PROBLEM TO BE SOLVED: To provide a pump capable of pouring amount of chemicals to be added by an addition unit in accordance with flow rate of discharged liquid with high precision always and to provide a liquid supply device provided with the pump. SOLUTION: This pump is provided with a pressure se...

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Bibliographische Detailangaben
Hauptverfasser:	HATSUTORI CHIYOUKEN, ENDO TEN
Format:	Patent
Sprache:	eng
Schlagworte:	BLASTING CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY HEATING LIGHTING MECHANICAL ENGINEERING METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS PUMPS FOR LIQUIDS OR ELASTIC FLUIDS THEIR RELEVANT APPARATUS TRANSPORTING TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE WEAPONS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a pump capable of pouring amount of chemicals to be added by an addition unit in accordance with flow rate of discharged liquid with high precision always and to provide a liquid supply device provided with the pump. SOLUTION: This pump is provided with a pressure sensor 5 arranged in a discharge passage 4a in which liquid discharged from a pump part 1 flows, a current detection part 8 for detecting current in a motor part 2, and the addition unit 10 for adding a predetermined substance to the liquid flowing in the discharge passage 4a. A control part 7 drives the motor part 2 when pressure detected by the pressure sensor 5 is below a predetermined value and sets output of the motor part 2 to a predetermined value so that pressure is maintained at predetermined pressure when a current value detected by the current detection part 8 is less than a predetermined value. COPYRIGHT: (C)2006,JPO&NCIPI