METHOD AND DEVICE FOR ANALYZING INTERFERENCE FRINGE, ALIGNER HAVING THE ANALYZING DEVICE, AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide an analyzing method, an interference method, and an interferometer wherein an optical characteristic of an optical system to be tested is measured with a high degree of accuracy. SOLUTION: One embodiment of this invention is an analyzing method of an interference fri...

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1. Verfasser: KATO MASAKIYO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an analyzing method, an interference method, and an interferometer wherein an optical characteristic of an optical system to be tested is measured with a high degree of accuracy. SOLUTION: One embodiment of this invention is an analyzing method of an interference fringe generated by a light interference, and the method comprises steps of: obtaining information of a first interference fringe generated by the interference of two lights; obtaining information of a second interference fringe generated by varying by (2n+1)π radian (n is an integer number); and obtaining information by averaging phase information of the first and second interference fringes by use of the Fourier transformation on the basis of the obtained information of the first and second interference fringes. COPYRIGHT: (C)2006,JPO&NCIPI