MEASURING DEVICE AND ALIGNER LOADING SAME

PROBLEM TO BE SOLVED: To provide a measuring device which can highly precisely measure a wave face even if the NA of a projection optical system is large, and to provide an aligner having the measuring device. SOLUTION: The measuring device measures optical performance of an optical system to be detected, whose numerical aperture of an outgoing side is larger than 0.6. The device includes a numerical aperture reducing means for reducing the numerical aperture of light flux emitted from the optical system to be detected to be not more than 0.6, and a detector detecting interference fringes that light flux reflecting optical performance of the optical system to be detected forms through the numerical aperture reducing means. COPYRIGHT: (C)2006,JPO&NCIPI