FILM THICKNESS MEASUREMENT METHOD AND FILM THICKNESS MEASUREMENT PROGRAM

PROBLEM TO BE SOLVED: To provide a film thickness measurement method and a film thickness measurement program for accurately finding a film thickness value in view of the effect of an inclination of a film surface and the thickness of a substrate, and not presupposing that the refractive index of th...

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Bibliographische Detailangaben
Hauptverfasser: FUJIWARA YUTAKA, NAKAKUKI HIDEKI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a film thickness measurement method and a film thickness measurement program for accurately finding a film thickness value in view of the effect of an inclination of a film surface and the thickness of a substrate, and not presupposing that the refractive index of the film is already-known. SOLUTION: A spectral reflectivity model is prepared in view of the effect of the inclination of the film surface and the thickness of the substrate to perform a comparison operation of this model with measured spectral reflectivity, thereby accurately finding the film thickness value. First-stage and second-stage theoretical curves of reflectivity are prepared from a wavelength dispersion expression model of a refractive index. A film thickness value, which minimizes the mean square error between the second-stage theoretical curve and data on the measured spectral reflectivity, is used as a measurement result on a film thickness to be found. COPYRIGHT: (C)2006,JPO&NCIPI