METHOD FOR MANUFACTURING ACTIVE MATRIX SUBSTRATE, ACTIVE MATRIX SUBSTRATE, ELECTRO-OPTIC DEVICE, AND ELECTRONIC APPLIANCE

PROBLEM TO BE SOLVED: To provide a method for manufacturing an active matrix substrate for reducing the number of steps where a dry process and photolithographic etching are combined. SOLUTION: The method includes: a first step of forming lines 40, 42, 46 in a lattice pattern where the line 42 in either a first direction or a second direction is divided at an intersection 56 on a substrate P; a second step of forming a layered portion comprising an insulating film and a semiconductor film 30 on the intersection 56 and a part of lines 40, 42, 46; and a third step of forming a conductive layer 49 on the layered portion so as to electrically connect the divided line 42, and forming a pixel electrode 45 to be electrically connected to the line 42 through the semiconductor film 30. The step of forming the conductive layer 49 and the pixel electrode 45 includes a step of forming a bank by a liquid drop discharge method, the bank which segments the conductive layer 49 and the pixel electrode 45, and a step of depositing a functional liquid containing a conductive material on the region segmented by the bank. COPYRIGHT: (C)2006,JPO&NCIPI