YTTRIUM-BASED CERAMIC COATED MATERIAL AND METHOD OF MANUFACTURING THE SAME

PROBLEM TO BE SOLVED: To provide an yttrium-based ceramic coated material that is a material having a coating which is excellent in corrosion resistance to a corrosive gas, plasma, etc., that being excellent in adhesion between a substrate and the coating, and being suitably used for a semiconductor...

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Hauptverfasser:	FUJIMORI HIROYUKI, SOTODANI EIICHI, NAGAHAMA TOSHIO, YOKOYAMA YU
Format:	Patent
Sprache:	eng
Schlagworte:	ARTIFICIAL STONE BASIC ELECTRIC ELEMENTS CEMENTS CERAMICS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIME, MAGNESIA METALLURGY REFRACTORIES SEMICONDUCTOR DEVICES SLAG SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF NATURAL STONE
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an yttrium-based ceramic coated material that is a material having a coating which is excellent in corrosion resistance to a corrosive gas, plasma, etc., that being excellent in adhesion between a substrate and the coating, and being suitably used for a semiconductor manufacturing process especially for repeated operations in a plasma treatment apparatus, and a method of manufacturing the same. SOLUTION: The yttrium-based ceramic coated material is manufactured by a manufacturing method provided with: a step of forming a DLC (diamond-like carbon) film on a substrate surface; and a step of forming an yttrium-based ceramic film on said DLC film by way of an MOD (metal-organic deposition) method. COPYRIGHT: (C)2006,JPO&NCIPI