SURFACE POLISHING METHOD AND DEVICE THEREFOR

PROBLEM TO BE SOLVED: To provide a polishing method and a polishing device providing a high efficiency and a longer operating life. SOLUTION: Dressing effect on the tip end of fixed abrasive grains using loose abrasive grains is surely provided by making the fixed abrasive grains a granular porous m...

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1. Verfasser: CHO SUSUMU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a polishing method and a polishing device providing a high efficiency and a longer operating life. SOLUTION: Dressing effect on the tip end of fixed abrasive grains using loose abrasive grains is surely provided by making the fixed abrasive grains a granular porous material bonding the fixed abrasive grains in the state where the fixed abrasive grains does not include a binder and a lot of primary grains form pores among them. As shown in Figure A, the addition of the loose abrasive grains 22 accelerates the wear of the machined surface acting on the machined surface of the fixed abrasive grains workpiece of the fixed abrasive grains 20, and unceasingly accelerates generation of fine cutting edges on the machined surface of the workpiece to maintain high machining efficiency by the mixing effect with the loose abrasive grains. Dressing situation is shown in Figure B, in which a polishing tool is a polishing pad or a polishing grinding wheel. Though the grinding wheel and a binding material are simultaneously dressed, the part acting on the machined surface of the fixed abrasive grain is dressed as well as the embodiment 1, and there is no dropout from the binding material. COPYRIGHT: (C)2006,JPO&NCIPI