METHOD AND SYSTEM FOR FOCUS TEST OF LITHOGRAPHIC APPARATUS AND METHOD FOR MANUFACTURING DEVICE

PROBLEM TO BE SOLVED: To provide a method and a system for performing a focus test in a lithographic apparatus. SOLUTION: In the method, a substrate includes a layer of a radiation photosensitive material, the substrate is illuminated in the lithographic apparatus by a first focus sensitive feature...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	PIETERS MARCO JOHANNES ANNEMARIE, VAN DE VIN COEN, HAUSCHILD JAN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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