METHOD AND SYSTEM FOR FOCUS TEST OF LITHOGRAPHIC APPARATUS AND METHOD FOR MANUFACTURING DEVICE

PROBLEM TO BE SOLVED: To provide a method and a system for performing a focus test in a lithographic apparatus. SOLUTION: In the method, a substrate includes a layer of a radiation photosensitive material, the substrate is illuminated in the lithographic apparatus by a first focus sensitive feature...

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Hauptverfasser:	PIETERS MARCO JOHANNES ANNEMARIE, VAN DE VIN COEN, HAUSCHILD JAN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method and a system for performing a focus test in a lithographic apparatus. SOLUTION: In the method, a substrate includes a layer of a radiation photosensitive material, the substrate is illuminated in the lithographic apparatus by a first focus sensitive feature and a second focus feature, and the substrate is analyzed to provide results of a focus test by the first focus sensitive feature imaged on the substrate. The focus test is performed on a regularly manufactured wafer. When a prescribed statistical characteristic related to the second focus feature imaged on the substrate is entered into a prescribed limit or only when the prescribed statistical characteristic enters into the prescribed limit, the results of the focus test are accepted. The second focus feature may be a focus sensitive feature or a focus insensitive feature. COPYRIGHT: (C)2006,JPO&NCIPI