SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To improve avalanche resistance after reducing ON resistance in a semiconductor device such as a power MOSFET with a trench gate structure. SOLUTION: A power MOSFET 21 has an n-type drift layer 10 and a p-type base layer 11 laminated and formed thereon. A trench gate 17 is form...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: YAMAGUCHI YOSHIHIRO, ONO SHOTARO, MATSUKI HIROFUMI, KAWAGUCHI YUSUKE, ARAI KIYOTAKA
Format: Patent
Sprache:eng
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