METHOD AND APPARATUS FOR FORMING FOCUS MARK, AND ELECTRON BEAM IRRADIATION TYPE OPTICAL MASTER DISK EXPOSURE APPARATUS

PROBLEM TO BE SOLVED: To provide a method for forming a focus mark, mainly aiming to accurately and easily carry out standard focusing on a target and to carry out high-accuracy standard focusing on a rotating work so as to form a focus mark on the work, and to provide an apparatus therefor, and an electron beam irradiation type optical master disk exposure apparatus. SOLUTION: According to the method of forming the focus mark, a work is mounted on a rotating table which rotates on irradiating the work with an electron beam to expose, the work having a resist layer formed thereon is rotated at an optional constant speed, and a pin is pressed to the surface of the resist layer at a position where a focus mark is to be formed so as to strip and remove the resist layer in an arc pattern concentric with the rotation center of the rotation table to form a focus mark. COPYRIGHT: (C)2006,JPO&NCIPI