INFRARED LIGHT-LOW REFLECTING PROCESSED WOVEN OR KNITTED FABRIC

PROBLEM TO BE SOLVED: To provide a camouflage processed woven or knitted fabric which can achieve an objective infrared light region reflectance without deteriorating the hand of the fabric. SOLUTION: A method for producing a camouflage processed woven or knitted fabric comprises plainly dyeing a wo...

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Bibliographische Detailangaben
Hauptverfasser: ISHIMURA HIROMICHI, TANAKA KINGO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a camouflage processed woven or knitted fabric which can achieve an objective infrared light region reflectance without deteriorating the hand of the fabric. SOLUTION: A method for producing a camouflage processed woven or knitted fabric comprises plainly dyeing a woven or knitted fabric comprising polyamide fibers or a woven or knitted fabric comprising polyester fibers and containing polyamide fibers uniformly distributed in the woven or knitted fabric with a sulfur dye not containing a sulfide and a reducing agent and not having the double bond of sulfur to obtain the woven or knitted fabric exhibiting an infrared light reflectance of ≤65% in an infrared light wavelength region of 600 to 1,200 nm, and further dyeing the woven or knitted fabric comprising the polyamide fibers with an acidic dye and a pigment or dyeing the woven or knitted fabric comprising the polyester fibers and containing the polyamide fibers uniformly distributed in the woven or knitted fabric with a disperse dye and a pigment into a camouflage pattern exhibiting infrared light reflectance at multi-stages. COPYRIGHT: (C)2006,JPO&NCIPI