EXHAUST GAS TREATMENT APPARATUS IN SEMICONDUCTOR MANUFACTURING LINE

PROBLEM TO BE SOLVED: To effectively perform the cleaning treatment of the filter of a dust extractor while attaching the dust extractor to an exhaust gas treatment apparatus without relying on backwashing operation and to extend and keep the life of high dust extraction efficiency. SOLUTION: An exhaust gas decomposition device 2 for performing the decomposition of a diluted unreacted silane gas or the like and a PFC gas is provided in the exhaust gas extraction passage 1 in a semiconductor manufacturing line wherein the silane gas or the like is used as a raw material gas and the PFC gas is used as a cleaning gas or the like and the dust extractor 3 having the filter built therein is provided to the rear stage of the exhaust gas decomposition device 2. The dust extractor 3 is constituted so that its main body is formed into an airtight structure and the main body and the filter are formed of a material having high resistance against a fluoride compound. Further, a detoxifying device 4 for detoxifying the decomposed product gas passed through the dust extractor 3 is provided to the rear stage of the dust extractor 3 in the exhaust gas extraction passage 1. COPYRIGHT: (C)2006,JPO&NCIPI