EXPOSURE MASK AND MANUFACTURING METHOD THEREFOR

PROBLEM TO BE SOLVED: To provide an exposure mask which highly accurately ensures dimensions of an exposure pattern, and to provide a manufacturing method therefor. SOLUTION: The method for manufacturing an exposure mask includes: a step S1 of subjecting the figure data D0of a device pattern to optical proximity effect correction to obtain figure data D1of an exposure pattern 21 for a device; a step S2 of obtaining exposure data D2of an exposure pattern 22 for monitoring showing increase in a rising amount of an angle 22a, decrease in the number of angles 22a or extension in a side line between the angles 22a, compared to the exposure pattern 21 for a device; a step S4 of forming exposure patterns 21, 22 on a transparent substrate 20 by lithography; a step S5 of measuring dimensions of the exposure pattern 22 for monitoring; and a step S6 of ensuring the dimensions of the exposure pattern 21 for a device by dimensions of the exposure pattern 22 for monitoring. COPYRIGHT: (C)2006,JPO&NCIPI