DEVICE FOR TREATING SUBSTRATE

PROBLEM TO BE SOLVED: To efficiently recover a cleaning liquid after cleaning the surface of a substrate treated by a chemical agent for recycling in a simple structure. SOLUTION: Collision of a cleaning liquid discharged by a first liquid knife 421 and a cleaning liquid discharged by a second liqui...

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Bibliographische Detailangaben
Hauptverfasser: TOMIFUJI YUKIO, NAKAMURA TSUGIO
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To efficiently recover a cleaning liquid after cleaning the surface of a substrate treated by a chemical agent for recycling in a simple structure. SOLUTION: Collision of a cleaning liquid discharged by a first liquid knife 421 and a cleaning liquid discharged by a second liquid knife 422 in a range between the liquid knife 421 and the second liquid knife 422 on the substrate G generates the turbulent flow of the cleaning liquids on the surface of the substrate G. Since the substrate G transferred by a roller 81 is slanted in the substrate-width direction orthogonal to the direction of the substrate transfer, a treating liquid treated in the previous step and remaining on the substrate flows toward the side end of the lower part of the substrate G in the slanted position by the turbulent flow generated on the substrate. The treating liquid flowing down from the side end of the lower part in the substrate G-width direction is made to flow into a first discharging liquid opening 411 installed at the bottom surface of a liquid replacing vessel 41. COPYRIGHT: (C)2006,JPO&NCIPI