LITHOGRAPHY APPARATUS, MANUFACTURING METHOD FOR DEVICE, AND DEVICE MANUFACTURED BY THEM

PROBLEM TO BE SOLVED: To provide a manufacturing method for a lithography apparatus and device, having small variations of radiation beam strength, and is capable of eliminating the defect that a beam size becomes large. SOLUTION: This lithography apparatus is a scanning type wherein radiation beams...

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Bibliographische Detailangaben
1. Verfasser:	VAN DER VEEN PAUL
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a manufacturing method for a lithography apparatus and device, having small variations of radiation beam strength, and is capable of eliminating the defect that a beam size becomes large. SOLUTION: This lithography apparatus is a scanning type wherein radiation beams cross the surface of a substrate and scan it effectively. This apparatus for example, is equipped with a beam attenuator, having an attenuation value profile that changes as a function of position, along the scanning direction of a filter formulation. By making this attenuation value profile chosen properly, for example, the impact of light-receiving amount caused by the variations between pulses of pulse illumination sources can be equalized much better, which can make the illumination of the substrate more homogeneous. COPYRIGHT: (C)2006,JPO&NCIPI