METHOD FOR REFINING TRIMETHYLSILANE

PROBLEM TO BE SOLVED: To provide a method for refining trimethylsilanes useful as a film-forming material in the production of semiconductors. SOLUTION: This method comprises adsorbing and removing silanes, methylsilanes and dimethylsilanes in trimethylsilanes by using an active carbon in which at l...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SHIBAYAMA SHIGERO, OHASHI MITSUYA
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM CHEMISTRY METALLURGY ORGANIC CHEMISTRY
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