TREATMENT DEVICE

PROBLEM TO BE SOLVED: To realize good chemical formation treatment by resolving the problem of a conventional horizontal treatment device. SOLUTION: The treatment device 100 for performing chemical formation treatment for a substrate 101 has a first electrode 102 disposed in opposition to the substrate 101 above the substrate 101, and a second electrode 103 disposed in opposition to the substrate 101 below the substrate 101. It is provided with a chemical bath 104 for filling a chemical 105 between the substrate 101 and the second electrode 103, a first flow formation mechanism for forming the flow of the chemical 105 in an area near the lower surface of the substrate 101, and a second flow formation mechanism for increasing the flow of the chemical 105 flowing from a central part of the substrate 101 toward an outer circumference. The second flow formation mechanism has a flow control plate 111 disposed in opposition to the substrate 101 between the substrate 101 and the second electrode 103. The flow control plate 111 comprises a plurality of openings, and an opening disposed in the central part of the flow control plate 111 and an opening disposed in an area except the central part of the flow control plate 111 have different shapes. COPYRIGHT: (C)2006,JPO&NCIPI