ANALYZING FILTER

PROBLEM TO BE SOLVED: To remove obstruction from the viewpoint of the specification of the element of particulates to be originally measured, such that the element of the base member of a filter ends up to measuring other than the particulates, when the elemental analysis of the particulates capture...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: OGUCHI MITSUHIKO, NAKAGAWA YOSHIO, ICHIKAWA KATSUJI
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To remove obstruction from the viewpoint of the specification of the element of particulates to be originally measured, such that the element of the base member of a filter ends up to measuring other than the particulates, when the elemental analysis of the particulates captured by the filter are conducted by X-ray analyzer. SOLUTION: This analyzing filter 1 has a filter base 2 comprising a resin, having a large number of filter pores 3 with a pore size of 100-1,000 nm and a metal coating film 4, formed by applying gold (Au) on the surface of one side of the filter base 2 by ion sputtering. The thickness of the metal coated film 4 is desirably set to a degree that does not permit the electron beam of the X-ray analyzer to pierce and that does not close the filter pores 3 and is preferably set to 40-100 nm. COPYRIGHT: (C)2006,JPO&NCIPI