EXPOSURE APPARATUS

PROBLEM TO BE SOLVED: To provide an exposure apparatus that can be improved in throughput with, preferably, a small-sized constitution by utilizing optical modulation elements, and to provide a method of manufacturing device using the exposure apparatus. SOLUTION: The exposure apparatus includes a p...

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Bibliographische Detailangaben
1. Verfasser:	KATO MASAKIYO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an exposure apparatus that can be improved in throughput with, preferably, a small-sized constitution by utilizing optical modulation elements, and to provide a method of manufacturing device using the exposure apparatus. SOLUTION: The exposure apparatus includes a plurality of optical modulation elements each having at least one element which modulates incident light by giving a phase difference to the incident light, and a plurality of projection optical systems which project patterns on a body to be exposed by using diffracted light rays from the optical modulation elements. The optical modulation elements and projection optical systems are arranged in parallel. COPYRIGHT: (C)2006,JPO&NCIPI