PRODUCTION OF POLYMER-COATED PARTICLE FOR CHEMICAL MECHANICAL POLISHING

PROBLEM TO BE SOLVED: To produce a polymer-coated particles useful for carrying out chemical mechanical polishing of magnetic, optical, semiconductor or silicon substrates. SOLUTION: At first, a dispersion of particle cores in a non-aqueous solvent is prepared. Then, a polymeric precursor is introdu...

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Hauptverfasser: BARNEY NATHANIEL A, QUANCI JOHN, PARTCH RICHARD E, WANG HONGYU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To produce a polymer-coated particles useful for carrying out chemical mechanical polishing of magnetic, optical, semiconductor or silicon substrates. SOLUTION: At first, a dispersion of particle cores in a non-aqueous solvent is prepared. Then, a polymeric precursor is introduced into the dispersion and the polymeric precursor is reacted with the dispersion to form a polymer. At least a portion of the surface of the particle cores is coated with the polymer to form the polymer-coated particles having a solid outer polymeric shell. A non-aqueous solvent is substituted with water to form an aqueous mixture containing the polymer-coated particles. Then, an aqueous chemical mechanical polishing formulation is formed by using the polymer-coated particles without drying the polymer-coated particles. COPYRIGHT: (C)2006,JPO&NCIPI