METHOD FOR PRODUCING FILM OF NOBLE METAL, OXIDE FILM OF NOBLE METAL, AND SILICIDE FILM OF NOBLE METAL

PROBLEM TO BE SOLVED: To provide a method for comparatively easily depositing a film of a noble metal so as not to be contaminated by impurities. SOLUTION: This manufacturing method comprises the steps of: introducing a volatile halide of the noble metal, in the state of a gaseous phase, and hydroge...

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Hauptverfasser:	DUSSARAT CHRISTIAN, GATINEAU JULIEN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for comparatively easily depositing a film of a noble metal so as not to be contaminated by impurities. SOLUTION: This manufacturing method comprises the steps of: introducing a volatile halide of the noble metal, in the state of a gaseous phase, and hydrogen of a reducing agent, an oxidizing agent or a silicifying agent, in the state of a gaseous phase, into a reaction chamber (11) accommodating at least one substrate; and reacting both compounds with each other to deposit the film of the noble metal, the oxide film of the noble metal, or the silicide film of the noble metal on the substrate. COPYRIGHT: (C)2006,JPO&NCIPI