OPTICAL CHARACTERISTIC MEASURING DEVICE AND METHOD, SEMICONDUCTOR EXPOSURE DEVICE AND EXPOSURE METHOD USING OPTICAL CHARACTERISTIC MEASURING DEVICE, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a measuring device and a method for measuring highly accurately an optical characteristic of an optical system to be inspected. SOLUTION: In order to solve the problem, this measuring device for measuring the optical characteristic of the optical system to be inspect...

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1. Verfasser: KATO MASAKIYO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a measuring device and a method for measuring highly accurately an optical characteristic of an optical system to be inspected. SOLUTION: In order to solve the problem, this measuring device for measuring the optical characteristic of the optical system to be inspected by using interference is characterized by having a spherical surface wave generation means illuminated by light from a light source, for generating a spherical surface wave; a light splitting means for splitting the light from the light source; a mask having a slit arranged on a position where light on one side in light passing the spherical surface wave generation means and the light splitting means to be thereby changed into two spherical surface waves and entering the optical system to be inspected is condensed; and a light receiving means for receiving interference fringes formed by light passing the slit and light not passing the slit via the optical system to be inspected. COPYRIGHT: (C)2006,JPO&NCIPI